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三沟道BCCD在X光区光电特性的数值模拟
引用本文:王玉新,宋敏.三沟道BCCD在X光区光电特性的数值模拟[J].光电子.激光,2001,12(4):378-381.
作者姓名:王玉新  宋敏
作者单位:辽宁师范大学物理系,大连 116029
摘    要:本文对三沟道体电荷耦合器件(BCCD)在X光区的光电特性进行了数值模拟,结果表明:磁对X光的吸收曲线了硅制的三沟道BCCD不能在XI我区实现多光谱成像,通过理论分析,指出了能保证BCCD在X光区工作的衬底材料所应满足的吸收曲线,利用这种新材料制成的三沟道BCCD,其光敏特性可以分别在1.8keV,1.2keV,0.6keV处出现最大值。

关 键 词:三沟道  体电荷耦合器件  数值模拟  X光  光电特性
文章编号:1005-0086(2001)04-0378-04
修稿时间:2000年8月28日

The Numerical Simulation of Photoelectric Characteristic of Three-channel Bulk Charge-coupled Device in the Region of X-ray
WANG Yu xin,SONG Min.The Numerical Simulation of Photoelectric Characteristic of Three-channel Bulk Charge-coupled Device in the Region of X-ray[J].Journal of Optoelectronics·laser,2001,12(4):378-381.
Authors:WANG Yu xin  SONG Min
Abstract:In this paper the photoelectric characteristics of the three channel bulk charge coupled device (BCCD) are simulated in the region of X ray.The results show that the silicon three channel BCCD can not realize multi spectral imaging in the region of X ray.Based on the result of theoretical research the absorption coefficient curve of a substrate material has be found,which ensure the three channel BCCD work in the region of X ray.The three channel BCCD made by the new material will have three maxim positions of the spectral photosensitivity at 1.8 keV,1.2 keV and 0.6 keV,respectively.
Keywords:three  channel  bulk charge  coupled device (BCCD)  photosensitivity
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