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Inductivity phenomena in local polycrystalline silicon films
Affiliation:1. LPICM, CNRS, École Polytechnique, Institut Polytechnique de Paris, Palaiseau 91128, France;2. Kutateladze Institute of Thermophysics SB RAS, Novosibirsk 630090, Russia;3. Institut Photovoltaïque d''Ile-de-France (IPVF), 18 Boulevard Thomas Gobert, Palaiseau 91120, France
Abstract:The capacitance-voltage characteristics of epitaxially grown polycrystalline silicon local films were investigated in the frequency range 0.465-10 MHz. A transition in the character of the capacitance from reactive conductivity to inductive behaviour was discovered.It is shown that under illumination the inductance transformed into a capacitance and the negative resistance region disappeared from the current- voltage curve.It is suggested that inductivity phenomena in polycrystalline silicon films occur by processes of recharging of deep levels.
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