The influence of deposition temperature on the crystalline and electrical properties of thin silver films |
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| Affiliation: | 1. AGH University of Science and Technology, International Centre of Electron Microscopy for Material Science and Faculty of Metals Engineering and Industrial Computer Science, Krakow, Poland;2. V.N. Karazin Kharkiv National University, Faculty of Physics and Technology, 4 Svobody sq, Kharkov, Ukraine;1. Interventional Neuroradiology, Sapienza University of Rome, Rome, Italy;2. Neuroradiology Department, University Hospital Güi-de-Chauliac, Centre Hospitalier Universitaire de Montpellier, Montpellier, France;3. Department of Radiology, NYU Langone Health, New York, New York, USA;4. Department of Neurological Surgery, Endovascular Neurosurgery, University of Catania, Catania, Italy;5. Department of Neurological Surgery, University of Catania, Catania, Italy;1. Applied Physics Program, University of Michigan, Ann Arbor, Michigan, USA;2. Department of Radiology, University of Michigan Health System, Ann Arbor, Michigan, USA;3. Department of Biomedical Engineering, University of Michigan, Ann Arbor, Michigan, USA;4. School of Dentistry, University of Michigan, Ann Arbor, Michigan, USA;5. Department of Biological Chemistry, University of Michigan Medical School, Ann Arbor, Michigan, USA |
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| Abstract: | Silver films were evaporated onto glass substrate under ultrahigh vacuum conditions and investigated using X-ray diffraction analysis and electrical measurements. The influence of the deposition temperature on the crystallite size, the surface roughness and the electrical properties was studied by analysing the width, intensity and fine structure of the diffraction peaks and the film resistivity. |
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