The influence of deposition parameters on the optical and electrical properties of r.f.-sputter- deposited indium tin oxide films |
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| Affiliation: | 1. School of Materials Science and Engineering, Xian University of Technology, Xian 710048, China;2. Advanced Materials Analysis and Test Center, Xian University of Technology, Xi’an 710048, China;3. School of Biological and Chemical Engineering, Panzhihua University, Panzhihua 617000, China;4. Superconducting Materials Research Center, Northwest Institute for Nonferrous Metal Research, Xi’an, Shaanxi, 710016, China;1. Laboratory of Materials, Energy and Environment (LaMEE), Physics Department, Faculty of Sciences Semlalia, Cadi Ayyad University, P. O. Box 2390, Marrakech, 40000, Morocco;2. National School of Applied Sciences, Ibn Zohr University, Avenue Tamesoult, Agadir, 80000, Morocco;1. School of Opto-electronic and Communication Engineering, Xiamen University of Technology, Xiamen, 361024, PR China;2. Fujian Key Laboratory of Optoelectronic Technology and Devices, Xiamen University of Technology, Xiamen, 361024, PR China;3. Department of Materials Science and Engineering, Da-Yeh University, Changhua, 51591, Taiwan;1. School of Mechanical and Electrical Engineering, Jingdezhen Ceramic Institute, Jiangxi 333001, China;2. School of Materials Science and Engineering, Jingdezhen Ceramic Institute, Jiangxi 333001, China;3. School of Physics and Electronic Information, Shangrao Normal University, Shangrao, Jiangxi 334001, China |
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| Abstract: | The fabrication and characterization of indium tin oxide thin films prepared by r.f. sputter deposition from a target of composition 90mol.% In2O3-10mol.%SnO2 are described. The properties were found to depend on the rate of deposition, the post-deposition heat treatment and the composition of the sputtering gas. Using the optimum combination of these parameters, films with a resistivity of 1.36 x 10-4 Ω cm were produced. Films with a thickness of less than 1000 Å had a visible transmittance of greater than 80% for wavelengths in the range 450–1500 nm (being greater than 90% above 550 nm). |
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