|
|||||
|
|
| 电弧离子镀基体沉积温度计算 | |
| 引用本文： | 黄美东,林国强,董闯,孙超,黄荣芳,闻立时. 电弧离子镀基体沉积温度计算[J]. 材料热处理学报, 2001, 22(4): 75-80 |
| 作者姓名： | 黄美东 林国强 董闯 孙超 黄荣芳 闻立时 |
| 作者单位： | 1. 中国科学院金属研究所,辽宁沈阳,110016;大连理工大学三束国家重点实验室,辽宁大连,116024 2. 大连理工大学三束国家重点实验室,辽宁大连,116024 3. 中国科学院金属研究所,辽宁沈阳,110016 |
| 基金项目： | 国家自然科学基金资助 (50 0 71 0 1 7) |
| 摘 要： | 较详细地考察了电弧离子镀时影响基体沉积温度的因素及影响程度，应用能量平衡原理建立了计算基体沉积温度的数学模型。采用该计算模型分析了基体材质、形状与电弧离子镀膜工艺参数改变时基体温度的变化，经实验验证，模型计算与实验数据基本吻合。 |
| 关 键 词： | 计算 基体温度 电弧离子镀 镀膜 |
| 文章编号： | 1009-6264(2001)04-0075-06 |
Calculation on Substrate Temperatures of Arc Ion Plating |
|
| HUANG Meidong ,,LIN Guoqiang ,DONG Chuang ,SUN Chao ,HUANG Rongfang ,WEN Lishi. Calculation on Substrate Temperatures of Arc Ion Plating[J]. Transactions of Materials and Heat Treatment, 2001, 22(4): 75-80 | |
| Authors: | HUANG Meidong LIN Guoqiang DONG Chuang SUN Chao HUANG Rongfang WEN Lishi |
| Affiliation: | HUANG Meidong 1,2,LIN Guoqiang 1,DONG Chuang 1,SUN Chao 2,HUANG Rongfang 2,WEN Lishi 2 |
| Abstract: | The influences of many factors on substrate temperature have been studied in detail during arc ion plating (AIP) in this paper. A calculation model for substrate temperature has been established on the basis of energy conservation principle. The model was used to analysis the change of substrate temperatures at different substrate material, size and different AIP process parameters. The calculated results are consistent well with the experiments. |
| Keywords: | calculation substrate temperature arc ion plating |
| 本文献已被 CNKI 维普 万方数据 等数据库收录！ | |