硅光电二极管结构特性研究

为探讨光电二极管工作机理及其改进潜力,从一款常规光电二极管应用产品的设计入手,采用光敏区尺寸逐渐变大、呈规律性排列的硅光电二级管串联的结构,分析其特性与机理.在此基础上对同类产品进行优化,详细阐述新结构工艺原理与实现方式,分别从器件结构、工作原理、不同结构的优劣点等方面对比改进前后两种不同结构光电二极管的特性.从工艺参...

Study on Structural Characteristics of Silicon Photodiode

In order to discuss the working mechanism and improvement potential of photodiodes,starting with the design of a conventional photodiode application product,the series structure of silicon photodiodes with gradually larger photosensitive area and regularly arranged is adopted,and its characteristics and mechanism are analyzed.On this basis,the similar products are optimized,and the process principle and implementation of the new structure are elaborated in detail.The characteristics of two different structures of photodiodes before and after improvement are compared from the aspects of device structure,working principle and advantages and disadvantages of different structures.The selection of substrate type and substrate resistivity,and the determination of anti-reflection film structure and thickness of the improved photodiode are analyzed in detail from the angle of process parameter selection.The optimization of the device's ID dark current parameter control is also discussed.