| Electrodeposition behavior of nanocrystalline CoNiFe soft magnetic thin film |
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| 引用本文： | 李劲风 张昭 阴军英 俞耿华 蔡超 张鉴清. Electrodeposition behavior of nanocrystalline CoNiFe soft magnetic thin film[J]. 中国有色金属学会会刊, 2006, 16(3): 659-665. DOI: 10.1016/S1003-6326(06)60117-9 |
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| 作者姓名： | 李劲风 张昭 阴军英 俞耿华 蔡超 张鉴清 |
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| 作者单位： | School of Materials Science and Engineering Central South University Changsha 410083 China Department of Chemistry Zhejiang University Hangzhou 310027 China，Department of Chemistry Zhejiang University Hangzhou 310027 China，Department of Chemistry Zhejiang University Hangzhou 310027 China，Department of Chemistry Zhejiang University Hangzhou 310027 China，Key Laboratory of Energy Resource and Chemical En gineering Ningxia University Yinchuan 750021 China，Department of Chemistry Zhejiang University Hangzhou 310027 China |
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| 摘 要： | 1 Introduction Soft magnetic materials are a central component of electromagnetic devices such as step motors, magnetic sensors, transformers and magnetic recording heads. The electrodeposited CoNiFe alloy that possesses a very high saturation magnetic f…
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| 关 键 词： | CoNiFe 纳米晶薄膜 软磁材料 脉冲电镀 晶化机制 |
| 收稿时间： | 2005-09-26 |
| 修稿时间： | 2006-02-08 |
Electrodeposition behavior of nanocrystalline CoNiFe soft magnetic thin film |
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| LI Jing-feng,ZHANG Zhao,YIN Jun-ying,YU Geng-hua,CAI Chao,ZHANG Jian-qing. Electrodeposition behavior of nanocrystalline CoNiFe soft magnetic thin film[J]. Transactions of Nonferrous Metals Society of China, 2006, 16(3): 659-665. DOI: 10.1016/S1003-6326(06)60117-9 |
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| Authors: | LI Jing-feng ZHANG Zhao YIN Jun-ying YU Geng-hua CAI Chao ZHANG Jian-qing |
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| Affiliation: | 1. School of Materials Science and Engineering, Central South University, Changsha 410083, China;2. Department of Chemistry, Zhejiang University, Hangzhou 310027, China;3. Key Laboratory of Energy Resource and Chemical Engineering, Ningxia University, Yinchuan 750021, China;1. Bashkir State University, 32, Validy Str., Ufa, 450076, Russia;2. Institute of Molecule and Crystal Physics Ufa Research Centre of Russian Academy of Sciences, Prospekt Oktyabrya 151, Ufa, 450075, Russia;1. Department of Engineering Mechanics, Shijiazhuang Tiedao University, Shijiazhuang 050043, PR China;2. Department of Civil Engineering, The University of Hong Kong, Hong Kong, China;1. Materials Science Centre, Department of Nuclear Physics, University of Madras, Guindy Campus, Chennai 600 025, India;2. Department of Inorganic Chemistry, University of Madras, Guindy Campus, Chennai 600 025, India;1. School of Materials Science and Engineering, Tongji University, Shanghai, China;2. School of Materials Science and Engineering, University of Shanghai for Science and Technology, Shanghai, China |
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| Abstract: | The electroplating behavior of nanocrystalline CoNiFe soft magnetic thin film with high saturation magnetic flux density (Bs>2.1 T) and low coercivity (Hc) was investigated using cyclic voltammetry and chronoamperometry methods in conjunction with the scanning electron microscopy (SEM/EDX). The results show that, under the experimental conditions, the co-deposition of CoNiFe film behaves anomalously due to the atomic radii of iron series elements following the order of rFe>rCo>rNi. In the case of lower electroplating current density, the co-deposition of CoNiFe film follows a 3-D progressive nucleation/growth mechanism, while in the case of higher electroplating current density, which follows a 3-D instantaneous nucleation/growth mechanism. Meanwhile, the change of nucleation mechanism of CoNiFe film with electroplating current density was interpreted theoretically in the light of quantum chemistry. |
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| Keywords: | nanocrystalline CoNiFe film soft magnetism pulse-reverse electroplating anomalous co-deposition electrocrystallization mechanism |
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