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GaN and AlGaN metal–semiconductor–metal photodetectors
Authors:I Ferguson  C A Tran  R F Karlicek Jr  Z C Feng  R Stall  S Liang  Y Lu and C Joseph
Affiliation:

a EMCORE Corporation, 394 Elizabeth Ave, Somerset, UK

b ECE Department, Rutgers University, Piscataway, NJ 08855, USA

c Physics Department, Rutgers University, Piscataway, NJ 08855, USA

Abstract:GaN based interdigital metal–semiconductor–metal (MSM) photodetectors have been successfully fabricated. The MSM structures were patterned on highly resistive GaN and the ternary compound, AlGaN. For the highly resistive GaN detector, the lowest dark current is not, vert, similar0.1 nA and the UV responsivity of the device was about 460 A W−1 at a DC bias of 5 V. The AlGaN with 24% Al exhibited larger gains of up to 106 A W−1 at 20 V, but at a very high dark current, 1 mA, and very long detector responses, greater than 60 s. The high gain in this device is not well understood. The preliminary measurements indicate that tunneling occurs at high electric fields since a negative temperature coefficient for the breakdown voltage was observed.
Keywords:Metal–semiconductor–metal photodetectors  GaN  AlGaN
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