Fabrication of polymer antireflective coatings by self-assembly of supramolecular block copolymer

We demonstrated a method of fabricating antireflective coatings based on the self-assembly of supramolecular block copolymer formed by polystyrene terminated with carboxyl (PS-COOH) and poly(methyl methacrylate) terminated with amine (PMMA-NH₂) via hydrogen bonding. Different porous films were generated by selectively removing PS-COOH from the spin-coated films with a selective solvent, cyclohexane, under different conditions. The refractive index of such porous film can be tuned from 1.49 down to 1.26 by controlling the thickness of the porous film. For the porous layer with n ˜ 1.26, the light transmittance of the glass about 97.93% was achieved in the visible range (λ ˜ 574 nm). By varying the solution concentration and exposing time in cyclohexane, inhomogeneous three-layered porous films were generated: top and bottom layers with high porosities and the middle layers with lower porosities, respectively. The light transmittance of the glass coated with this inhomogeneous film was about 98.00% in the near-infrared region corresponding to wavelength between 800 and 1400 nm. The wavelength region of the broadband antireflective films with high transmittance more than 99.00% can be fine tuned to 1200-2000 nm with increasing the film thickness.