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| 用于分布反馈光栅的纳米压印模板制作 | |
| 引用本文： | 王定理,刘文,周宁,徐智谋.用于分布反馈光栅的纳米压印模板制作[J].光学精密工程,2011,19(11):2731-2735. |
| 作者姓名： | 王定理 刘文 周宁 徐智谋 |
| 作者单位： | 1. 武汉光迅科技股份有限公司,湖北武汉430074;新一代光纤通信技术和网络国家重点实验室,湖北武汉430074 2. 武汉光迅科技股份有限公司,湖北武汉430074;华中科技大学武汉光电国家实验室,湖北武汉430074;新一代光纤通信技术和网络国家重点实验室,湖北武汉430074 3. 华中科技大学武汉光电国家实验室,湖北武汉,430074 |
| 基金项目： | 国家863高技术研究发展计划资助项目(No.2009AA03Z418) |
| 摘 要： | 高质量、低成本的压印模板的获得是采用纳米压印技术制作分布反馈光栅的难点,本文采用双层金属掩模及liftoff金属剥离方法制作了适用于紫外压印技术的石英基压印模板.首先,采用电子柬光刻技术在镀钛的石英基片表面直写出DFB光栅的光刻胶图形,接着,在其表面溅射一层金属镍并进行金属剥离得到与光刻胶相对的图形,最后采用电感耦合等... |
| 关 键 词： | 纳米压印 压印模板 分布反馈光栅 |
Nanoimprint stamp fabrication for DFB gratings |
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| WANG Ding-li,LIU Wen,ZHOU Ning,XU Zhi-mou.Nanoimprint stamp fabrication for DFB gratings[J].Optics and Precision Engineering,2011,19(11):2731-2735. | |
| Authors: | WANG Ding-li LIU Wen ZHOU Ning XU Zhi-mou |
| Affiliation: | WANG Ding-li 1,3,LIU Wen1,2,ZHOU Ning1,XU Zhi-mou2(1.Accelink Technologies Co.,LTD,Wuhan 430074,China,2.Wuhan National Laboratory for Optoelectronics,Huazhong University of Science and Technologies,430074 Wuhan,3.State Key Laboratory for New Optical Communication Technologies and Networks,China) |
| Abstract: | It is difficult to obtain a nanoimprint stamp with low cost and high quality in fabrication of Distributed Feedback(DFB)gratings.In this paper,the quartz stamp for semiconductor DFB gratings was fabricated by using double-layer metal mask and lift-off lithography.Firstly,the photoresist pattern of a DFB grating was written on a Ti coated quartz substrate by electron beam lithography,then a layer of metal Ni was sputtered on it to obtain a corresponding pattern by metal lift-off technology.Finally,the Induct... |
| Keywords: | nanoimprint nanoimprint stamp Distributed Feedback(DFB)grating |
| 本文献已被 CNKI 万方数据 等数据库收录！ | |