| 自组装——自底而上的纳米制造方法 |
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| 引用本文： | 阿兰·奥瑞尔登,曾安培,赵志龙. 自组装——自底而上的纳米制造方法[J]. 微纳电子技术, 2005, 42(5): 209-213 |
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| 作者姓名： | 阿兰·奥瑞尔登 曾安培 赵志龙 |
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| 作者单位： | 1. 爱尔兰国家微电子研究中心,爱尔兰科克,999015
2. 亚利桑那州立大学,美国坦普,85287-6106 |
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| 基金项目： | 美国国家科学基金资助项目(DMI-0002466,CMS-0115828,DMI-0423457) |
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| 摘 要： | 介绍了“自底而上”的自组装纳米制造方法中的一些关键技术。利用自组装技术将成形的或未成形的材料淀积在大面积基底上,制造出纳米结构和分子局域自组装装置,并通过由自组装技术发展而来的原子操作和蘸水笔纳米加工技术,以构建纳米尺度的图形。描述了与这些技术相关的原理和工艺过程以及其当前的应用和潜在的应用前景。
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| 关 键 词： | 纳米制造 自组装 纳米光刻技术 |
| 文章编号： | 1671-4776(2005)05-0209-05 |
| 修稿时间： | 2004-10-01 |
Self-Assembly: A Bottom-up Approach for Nanofabrication |
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| O'RIORDAN Alan,TSENG Ampere A,ZHAO Zhi-long. Self-Assembly: A Bottom-up Approach for Nanofabrication[J]. Micronanoelectronic Technology, 2005, 42(5): 209-213 |
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| Authors: | O'RIORDAN Alan TSENG Ampere A ZHAO Zhi-long |
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| Affiliation: | O'RIORDAN Alan1,TSENG Ampere A2,ZHAO Zhi-long2 |
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| Abstract: | The key techniques based on the bottom-up self-assembly approach for nanofabrication are reviewed. Using self-assembly technique can deposit unpatterned and patterned materials on large-area substrate to fabricate local self-assembly device of nanostructure and molecule. The creation of nanoscale patterns by atom manipulation and dip-pen nanolithography,which are evolved from self-assembly techniques,are also evaluated and discussed. For all the techniques reviewed,the associated principles and procedures as well as their current and potential applications are included. |
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| Keywords: | nanofabrication self-assembly nanolithography |
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