|
|||||
|
|
| 磁控溅射WS2薄膜的制备工艺及其性能 | |
| 引用本文： | 宋玉波,代明江,余志明,韦春贝,侯惠君,肖晓玲.磁控溅射WS2薄膜的制备工艺及其性能[J].真空,2011,48(2). |
| 作者姓名： | 宋玉波 代明江 余志明 韦春贝 侯惠君 肖晓玲 |
| 作者单位： | 1. 中南大学,材料科学与工程学院,湖南,长沙,410083;广州有色金属研究院,材料表面工程研究所,广东,广州,510651 2. 广州有色金属研究院,材料表面工程研究所,广东,广州,510651 3. 中南大学,材料科学与工程学院,湖南,长沙,410083 |
| 基金项目： | 广东省自然科学基金项目(07006996A) |
| 摘 要： | 采用孪生中频磁控溅射的方法在低温条件下制备了WS2薄膜,利用X-射线衍射仪(XRD)、扫描电子显微镜(SEM)、能谱仪(EDX)、显微硬度仪、划痕仪和球盘式摩擦磨损试验机对薄膜的物相结构、微观形貌以及摩擦学性能进行了研究。结果表明:所制备的WS2薄膜呈现出明显的(002)晶面择优生长,S/W原子比1.52,在大气环境中摩擦系数可低于0.01,载荷与转速对薄膜的摩擦系数影响显著,在一定范围内加大载荷和提高转速都会增大其摩擦系数。 |
| 关 键 词： | WS2薄膜 中频磁控溅射 低温 摩擦系数 |
Tungsten disulfide films deposited by magnetron sputtering and their properties |
|
| SONG Yu-bo,DAI Ming-jiang,YU Zhi-ming,WEI Chun-bei,HOU Hui-jun,XIAO Xiao-ling.Tungsten disulfide films deposited by magnetron sputtering and their properties[J].Vacuum,2011,48(2). | |
| Authors: | SONG Yu-bo DAI Ming-jiang YU Zhi-ming WEI Chun-bei HOU Hui-jun XIAO Xiao-ling |
| Affiliation: | SONG Yu-bo1,2,DAI Ming-jiang2,YU Zhi-ming1,WEI Chun-bei2,HOU Hui-jun2,XIAO Xiao-ling2 (1.School of Materials Science and Engineering,Central South University,Changsha 410083,China,2.Institute of Surface Engineering,Guangzhou Research Institude of Nonferrous Metals,Guangzhou 510651,China) |
| Abstract: | The WS2 thin films were deposited by twin-target MF magnetron sputtering process at low temperature,and their phase structure,surface micromorphology and tribological properties were investigated via SEM,EDX,XRD,microhardness gauge,scratch tester and ball-on-disc friction/wear test machine.The results showed that the films present obviously the preferential growth of(002) crystal plane and the S/W atomic ratio is 1.52.The friction coefficient of the films can be lower than 0.01 as tested in atmosphere and i... |
| Keywords: | WS2 thin film MF-magnetron sputtering low temperature friction coefficient |
| 本文献已被 CNKI 万方数据 等数据库收录！ | |