| FCVA法制备的超薄类金刚石薄膜的结构分析 |
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| 引用本文： | 车晓舟,尹云飞,马洪涛,刘凡新.FCVA法制备的超薄类金刚石薄膜的结构分析[J].真空,2011,48(2). |
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| 作者姓名： | 车晓舟 尹云飞 马洪涛 刘凡新 |
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| 作者单位： | 1. 华南理工大学材料科学与工程学院,广东,广州,510641
2. 东莞新科技术研究开发有限公司,广东,东莞,523087 |
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| 摘 要： | 用真空阴极过滤电弧(Filtered Cathode Vacuum Arc,FCVA)法制备厚度分别为50 nm,30 nm,10 nm,5 nm,2 nm的类金刚石(DLC)薄膜,利用拉曼光谱和电子能量损失谱研究了薄膜的结构,分析了硬度和内应力的变化趋势。结果表明,随着薄膜厚度的减小,可见光拉曼光谱高斯分解的G峰位置向低波数方向移动,D峰和G峰强度之比Id/Ig不断增大,G峰面积与D峰面积之比Ag/Ad减小;说明随着薄膜厚度的减小,DLC薄膜中的sp3键含量减少,有序化的sp2团簇增加。电子能量损失谱的结果也表明薄膜厚度的减小会引起薄膜中sp3键含量的减少。当薄膜的厚度由50 nm变为30 nm时,薄膜硬度由53.85 GPa减小为39.64 GPa,内应力由4.63 GPa降低为3.47 GPa,随着厚度降低,薄膜的硬度和内应力呈下降趋势。
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| 关 键 词： | 真空阴极过滤电弧 类金刚石薄膜 结构 |
Structural analysis of ultra-thin DLC films deposited by FCVA |
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| CHE Xiao-zhou,YIN Yun-fei,MA Hong-tao,LIU Fan-xin.Structural analysis of ultra-thin DLC films deposited by FCVA[J].Vacuum,2011,48(2). |
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| Authors: | CHE Xiao-zhou YIN Yun-fei MA Hong-tao LIU Fan-xin |
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| Affiliation: | CHE Xiao-zhou1,YIN Yun-fei1,MA Hong-tao2,LIU Fan-xin2(1.College of Materials Science & Engineering,South China University of Technology,Guangzhou 510641,China,2.SAE Technologies Development(Dongguan) Co.Ltd,Dongguan 523087,China) |
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| Abstract: | FCVA(Filtered Cathode Vacuum Arc) process was used to deposit the ultra-thin DLC films with thickness of 50nm,30nm,10nm,5nm and 2nm.Raman spectroscopy and electron energy loss spectrum(EELS) were employed to analyze the structure of the DLC films,with the changes in hardness and internal stress analyzed.Experimental results showed that the intensity ratio Id/Ig of peak D to peak G,where both derived from the Gauss fitting of visible Raman spectra,increases with the decreasing film thickness from 50nm to 2nm... |
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| Keywords: | FCVA DLC film structure |
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