| 玻璃及不锈钢衬底N型微晶硅薄膜的制备 |
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| 引用本文： | 郑文,陈永生,卢景宵.玻璃及不锈钢衬底N型微晶硅薄膜的制备[J].真空,2011,48(2). |
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| 作者姓名： | 郑文 陈永生 卢景宵 |
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| 作者单位： | 1. 滨州学院物理与电子科学系,山东,滨州,256600
2. 郑州大学材料物理教育部重点实验室,河南,郑州,450052 |
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| 摘 要： | 利用射频等离子体增强化学气相沉积(RF-PECVD)技术,以PH3为掺杂剂,在浮法玻璃衬底和不锈钢衬底上制备了纳米级的n型微晶硅薄膜。采用Wvase32型椭圆偏振光谱仪、Reinishaw2000型拉曼(Raman)光谱仪和高阻仪对薄膜进行测试,以研究沉积条件对薄膜沉积速率、晶化率和暗电导特性的影响,并对沉积功率和沉积气压进行双因素优化,绘制了双因素相图。
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| 关 键 词： | RF-PECVD n型微晶硅薄膜 不锈钢衬底 |
Study on N-type microcrystalline silicon film deposited on glass or stainless steel substrate |
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| ZHENG Wen,CHEN Yong-sheng,LU Jing-xiao.Study on N-type microcrystalline silicon film deposited on glass or stainless steel substrate[J].Vacuum,2011,48(2). |
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| Authors: | ZHENG Wen CHEN Yong-sheng LU Jing-xiao |
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| Affiliation: | ZHENG Wen1,CHEN Yong-sheng2,LU Jing-xiao2 (1.Department of Physics and Electronics,Binzhou College,Binzhou 256600,China,2.The key laboratory of Material Physics of the Ministry of Education of China,Zhengzhou 450052,China) |
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| Abstract: | The PH3-doped n-type microcrystalline silicon nano films were prepared by RF-PECVD(plasma-enhanced chemical vapor deposition) on glass and stainless steel substrates and tested with elliptic polarization spectrometry,Raman specstrometry and megger.The effects of deposition conditions on the deposition rate,crystallizability and dark conductivity of the films were thus studied.A double-factor phase diagram was given via the optimization of the two factors,ie.,the power and pressure in film deposition process... |
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| Keywords: | RF-PECVD N-type microcrystalline silicon film stainless steel substrate |
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