| Abstract: | Measurements done with scanning electron microscopes (SEMs) may lose their validity due to contamination and charging caused by the primary electron beam. The sample stage and the electron beam also slightly drift during the course of the measurements. Consequently, it is essential to find out the time limit of valid measurements, that is, the maximum time before the sample or its position changes too much. This paper describes digital time-lapse SEM, a useful tool for investigating the extent and effects of contamination and stage drift. It works with hardware and software that create a stack of sequential images. Later these images can be viewed as a short movie; it is also possible to apply all the image processing and analysis procedures that are otherwise applied to separate, individual images. This method gives a reliable way of measuring the rate of contaminant deposition and of stage and electron beam drift of SEMs, and it could be helpful in controlling these problems. |
