| Abstract: | Radio-Frequency Plasma Beam Sources — New tools for industrial particle beam induced thin film processes The applications for ion beam techniques has moved from pure base research to industry, mainly for microelectronics applications. Their potential for future surface and thin film processes are known to a large number of users and developers in this area. However such techniques are relative sophisticated and due to the costs industrial applications are often limited. RF-plasma beam technology with its specific advantages may be a possible candidate to overcome these restrictions. For some applications RF plasma beam technology is just on the step to an industrial use. But this technique is still not generally known, and its possibilities deserves more attention. Within this article the principle of plasma beam formation and construction of plasma beam formation and construction of plasma beam sources are described. Some application examples show the possibilities given to users with this technique. |
