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| PtSi薄膜超薄化及连续性研究 | |
| 引用本文： | 刘爽,宁永功,陈艾,刘俊刚,杨家德,李昆. PtSi薄膜超薄化及连续性研究[J]. 激光与红外, 2000, 30(4): 238-239 |
| 作者姓名： | 刘爽 宁永功 陈艾 刘俊刚 杨家德 李昆 |
| 作者单位： | 1. 电子科技大学信息材料工程学院,成都,610054 2. 重庆光电技术研究所,重庆,400061 3. 材料工程研究院,新加坡,119260 |
| 摘 要： | 减薄膜厚有利于提高ＰｔＳｉ红外探测器的量子效率。本文研究了膜厚减薄工艺对薄膜连续性的影响。用ＸＲＤ观察物相，ＳＥＭ、ＴＥＭ研究薄膜连续性，并给出理论解释，实验表明用混合生长（Ｓ－Ｋ）模式能形成超薄连续薄膜。 |
| 关 键 词： | PtSi膜 超薄膜 红外探测器 连续性 |
Study on the Ultra-thinned and Continuity of PtSi Film |
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| LIU Shuang,NING Yong-gong,CHEN Ai,LIU Jun-gang,YANG Jia-de,LI Kun. Study on the Ultra-thinned and Continuity of PtSi Film[J]. Laser & Infrared, 2000, 30(4): 238-239 | |
| Authors: | LIU Shuang NING Yong-gong CHEN Ai LIU Jun-gang YANG Jia-de LI Kun |
| Abstract: | Thinner PtSi film can increase the quantum efficiency of PtSi infrared detector.The effects of forming condition on the continuity of PtSi film are studied in this article,The continuity of film is investigated by SEM and TEM,and the phase of PtSi film by XRD.The theoretical explanation is also given.It is declarethat the continuous ultra thin PtSi film can be obtained by Stranski Krastanov model. |
| Keywords: | PtSi film ultra thin film continuity. |
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