| 分子玻璃光致抗蚀剂研究进展 |
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| 引用本文： | 徐娜,刘玉芹,王金玲,胡勇,孟磊. 分子玻璃光致抗蚀剂研究进展[J]. 吉林化工学院学报, 2012, 0(9): 12-16 |
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| 作者姓名： | 徐娜 刘玉芹 王金玲 胡勇 孟磊 |
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| 作者单位： | [1]吉林化工学院研究生处,吉林吉林132022 [2]中国石油吉林石化公司乙烯厂,吉林吉林132022 [3]吉林市龙潭区第二实验幼儿园,吉林吉林132021 [4]中山市福瑞特科技产业有限公司,广东中山528400 [5]吉林化工学院材料科学与工程研究中心,吉林吉林132022 |
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| 摘 要： | 随着半导体芯片集成度的快速提高,光刻技术的分辨率正由90、65和45 nm迈向更先进的32 nm或以下.而分子玻璃体抗蚀剂可能是下一代光刻技术的最好选择.本文阐述了分子玻璃光致抗蚀剂的设计思想,并介绍了几种性能良好的分子玻璃光致抗蚀剂.
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| 关 键 词： | 光致抗蚀剂 分子玻璃体 结构 |
Study on Molecular Glass Photoresists |
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| XU Na,LIU Yu-qin,WANG Jin-ling,HU Yong,MENG Lei. Study on Molecular Glass Photoresists[J]. Journal of Jilin Institute of Chemical Technology, 2012, 0(9): 12-16 |
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| Authors: | XU Na LIU Yu-qin WANG Jin-ling HU Yong MENG Lei |
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| Affiliation: | 1. Postgraduate Department Office, Jilin Institute of Chemical Technology, Jilin City 132022, China ;2. CNPC Jilin petrochemical company ethylene plant Jilin City 132022, China; 3. Second Experimental Kindergarten of Longtan District, Jilin City 132022, China;4. Science and technology industrial Co. Zhongshan City 528400, China; 5. Materials Science and Engineering Research Center,Jilin Institute of Chemical Technology,Jilin City 132022 ,China) |
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| Abstract: | As the semiconductor chip compositive rise quickly,lithography resolution is from 90 nm,65 nm and 45 nm towards more advanced 32 nm. While molecular glass photoresists may be the best choice of next generation lithography technology. The conception of molecular glass photoresist design is expounded, and several good performance of molecular glass photoresists are introduced |
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| Keywords: | photoresists molecular glass structure |
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