Positive and negative photoresist applications of thin films surface-photopolymerized from hexachlorobutadiene

Polymeric films deposited from the vapor of C₄Cl₆ by the surface-photopolymerization technique are electrically and mechanically continuous on various substrates when very thin. The thickness of the films depends upon irradiation time with wavelengths in the region 2000-3000Å. Re-irradiation in oxygen (air) of the polymeric films with light of these low wavelengths leads to patterned removal of the films. Since films 500Å thick and less can resist etchants for various substrates, a new and extremely thin positive photoresist system is possible. Resolution of etched substrates to lines a few microns wide has been demonstrated. If the polymeric films from C₄Cl₆ are deposited from the monomeric vapor at lower substrate temperatures they are soluble in various solvents. Re-irradiation with UV light with the films in vacuum produces a patterned fixing of the polymer with respect to acetone. A negative photoresist system is therefore possible. Again, films of thickness 500Å and less can resist various etchants such that substrates can be etched to high resolution.