| 深亚微米工艺用二次纯水系统 |
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| 引用本文： | 王铁坤,华卫群,孙勇山.深亚微米工艺用二次纯水系统[J].电子与封装,2002,2(2):38-44. |
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| 作者姓名： | 王铁坤 华卫群 孙勇山 |
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| 作者单位： | 无锡微电子科研中心,江苏,无锡,214035 |
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| 摘 要： | 本文介绍了深亚微米工艺用二次超纯水系统主要工艺流程及其各部分的作用。比较了一次纯水电阻率,二次纯水电阻率及二次纯水 TOC 含量的相互关系。讨论了半导体集成电路制造工艺对超纯水的水质要求以及水中杂质对半导体工艺的影响。
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| 关 键 词： | 深亚微米 一次纯水 二次纯水 |
| 修稿时间： | 2002年1月30日 |
A 2nd Pure Water System for Deep Submicron Processes |
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| WANG Tie-ktm HUA Wei-qun SUN Yong-shan.A 2nd Pure Water System for Deep Submicron Processes[J].Electronics & Packaging,2002,2(2):38-44. |
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| Authors: | WANG Tie-ktm HUA Wei-qun SUN Yong-shan |
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| Abstract: | The main process flow of a 2nd pure water system for deep submicron processes and the functions of the various parts of the system are desribed.Comparisons are made between the resistivity of 1st pure water, resistivity of 2nd Pure water and TOC content of 2nd pure water,Requirements of semiconductor IC fabrication processes for the quality of ultropure water on semiconductor processes are discussed. |
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| Keywords: | Deep submicron 1st pure water 2nd pure water |
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