热丝法气相沉积金刚石薄膜的影响因素

由于热丝法气相沉积金刚石薄膜成膜质量好、设备简单、成本低而得到广泛应用。本文探求了工具上应用最广泛的硬质合金上利用热丝法沉积金刚石薄膜的原理，并着重讨论了在该系统中影响金刚石薄膜质量的几个因素：预处理技术、碳源浓度、温度和气压，在金刚石的形核时期和生长时期这些因素的作用是不同的，同时这些因素又相互影响。根据影响因素制定出了最优的工艺参数，最后在硬质合金上得到了均匀而致密的金刚石薄膜，经XRD分析，由（111)和(220)晶面组成，主要是(111)面，晶粒尺寸平均为113．5nm，这些探索为金刚石沉积技术在工具上的大规模应用打下了基础。

HOT-FILAMENT-CHEMICAL-VAPOR-DEPOSITED DIAMOND FILM AND ITS INFLUENCE FACTORS

Hot filament chemical vapor deposition (HFCVD) is used widely in industry due to its high quality, simple equipment and low cost. The growth principle of diamond films on carboloy metal by HFCVD was introduced in this paper. It is observed that many factors, such as the pretreatment technology, methane concentration, temperature and pressure in the reactor, influenc strongly the quality of diamond film. Effects of these factors are different between the nucleation period and the growth period, and these factors influence each other. Based on these considerations, the best condition for diamond film deposition on carboloy metal was found in this system. Finally, uniform and compact diamond films deposited by HFCVD were obtained. XRD showed a high diamond (111) peak and a low diamond (220) peak, and standard peak width analysis indicated a crystal size of 113.5nm.