| 掩模光刻机中找平控制研究 |
| |
| 引用本文： | 周庆奎,刘玄博,李霖.掩模光刻机中找平控制研究[J].电子工业专用设备,2010,39(11):1-3,30. |
| |
| 作者姓名： | 周庆奎 刘玄博 李霖 |
| |
| 作者单位： | 中国电子科技集团公司第四十五研究所; |
| |
| 摘 要： | 基片与掩模版(或找平版)找平技术是掩模光刻机中的一个关键技术,找平的结果直接决定了光刻机的分辨率精度。找平的目的就是要实现掩模版平面和基片平面的平行,实现基片与掩模版在移动到设定的一个微小间隙后,基片上的各点到掩模版的距离相同,从而保证基片上图形的一致性,提高设备的分辨率。找平过程的控制主要在对找平的判断、压力采集反馈、找平压力的控制等方面。
|
| 关 键 词： | 掩模光刻机 找平 分辨率 找平判断 压力采集 找平压力控制 |
Study on the Compensation Controlling of Mask Aligner |
| |
| ZHOU Qingkui,LIU Xuanbo,LI Lin.Study on the Compensation Controlling of Mask Aligner[J].Equipment for Electronic Products Marufacturing,2010,39(11):1-3,30. |
| |
| Authors: | ZHOU Qingkui LIU Xuanbo LI Lin |
| |
| Affiliation: | ZHOU Qingkui,LIU Xuanbo,LI Lin(The 45th Research Institute of CETC,Beijing 101601,China) |
| |
| Abstract: | Between mask and substrate plane compensation is a key technology of Mask Aligner,and the result will affect the printing resolution directly.The compensation parallel mask plane with substrate plane,and lock them.When we drive the two planes to a small proximity,the distance between mask plane and substrate plane are the same.It is good for the consistency of graphics resolution on the substrate.The process of the compensation includes the judgment of the process、sampling the compensation pressure、control1ing the compensation pressure and so on. |
| |
| Keywords: | Mask Aligner Compensation Resolution Compensation judgment Pressure sampling Pressure controlling |
| 本文献已被 CNKI 维普 万方数据 等数据库收录！ |
|
