Abscheidung,Charakterisierung und Anwendung von Plasma‐Polymerschichten auf HMDSO‐Basis

Deposition, Characterisation and Application of HMDSO‐based Plasma Polymer Films High quality organosilicone coatings can be produced via plasma enhanced chemical vapor deposition of hexamethyldisiloxane (HMDSO). In this article aspects of deposition, analysis and application of HMDSO/O₂ processes are presented. The coatings’ organic/inorganic character can be adjusted by an appropriate combination of plasma power and gas mixture which is shown by XPS. Particularly multi layer and gradient layer systems can be deposited within the same process. Quantitative chemical depth profiling of such layer systems can be performed by secondary neutral mass spectrometry (SNMS). AFM investigations exhibit that the surface roughness of the coatings is determined by the appearance of hemispherical agglomerates, which is more pronounced, the more glass‐like the coatings are. As an example of use it is shown, that an appropriate HMDSO plasma treatment can distinctly improve the tribological behavior of elastomer devices. The presented work is done within a project of the German Federal Ministry of Education and Research (BMBF) entitled: “nano functionalization of interfaces for data‐, textile‐, building‐, medicine‐, bio‐, and aerospace‐ technology”.