The spreading resistance of MOSFET's

A simple mathematical expression for source and drain spreading resistance near the channel end of MOSFET's has been derived by calculating the capacitance of the same geometry, using the analogy between the resistivity of conductors and the permittivity of dielectrics (R = ρε/C). Furthermore, it is shown qualitatively and experimentally that the value of the resistivity, which is the most influential parameter in the equation derived, should be determined by a doping concentration equal to the inversion channel carrier concentration, rather than by the source and drain bulk properties.