Temperature effect on ZnO/Si thin film grown using metal organic chemical vapor deposition |
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| Authors: | Kwang -Sik Kim Jung -Ho Lee Hyoun Woo Kim |
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| Affiliation: | 1. School of Materials Science and Engineering, Inha University, 253 Yonghyeon 3-dong, Nam-gu, 402-751, Incheon, Korea
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| Abstract: | We investigated the effect of deposition temperature on the growth and structural quality of ZnO films on Si (100) substrate using the metal organic chemical vapor deposition (MOCVD) technique. We revealed that highly c-axis oriented ZnO thin films were obtained at the temperature of 400°C. The film crystallinity improved and the surface smoothness decreased with increasing growth temperature. |
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