PLZT薄膜的溅射沉积和热处理

用磁控射频溅射方法在不加热的硅衬底上沉积生长锆钛酸铅镧（PLZT）薄膜。由混浇法制备了两只氧化物靶材PLZT（5／65／35）和（9／65／35）。初生态薄膜主要是非晶态，所希望的钙钛矿相结构由后处理形成。研究了不同退火条件下焦绿石相和钙钛矿相的转变，实验表明氧气氛下由常规退火（LFA）和快速退火（RTA）可形成钙钛矿相PLZT薄膜。

DEPOSITION AND ANNEAL OF (PB,LA) (ZR,TI)O_3 THIN FILMS BY RF SPUTTERING

Thin films of lead lanthanum zirconate titanate (PLZT) were deposited by rf magnetron sputtering from oxide targets onto unheated Si substrates. Both the targets, PLZT (5/65/35 ) and (9/65/35), were prepared by mixing the oxides and calcining at high temperature. The deposited PLZT films were mainly amorphous. The desired perovskite phase was formed by post annealing.The pyrochlore to perovskite phase transformation was studied as a function Of annealing conditions. It was observed that the anneal has a marked effect on diffusion processes and crystallization of PLZT films Perovskite PLZT phases were formed in O2 ambient by the post annealing process using rapid thermal annealing (RTA) or conventional furnace annealing (CFA).