| 反应溅射镀膜的等离子体发射控制系统设计 |
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| 引用本文： | 肖劲宇,和军平.反应溅射镀膜的等离子体发射控制系统设计[J].计算机测量与控制,2011,19(7). |
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| 作者姓名： | 肖劲宇 和军平 |
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| 作者单位： | 1. Maxford Technology LLC, Santa Clara, CA 95054,USA
2. 哈尔滨工业大学深圳研究生院,广东深圳,518055 |
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| 摘 要： | 介绍了一种基于Allen-Bradley可编程控制器的等离子体发射监控闭环控制系统;在介绍溅射镀膜工作原理的基础上,分析了影响镀膜性能的多个因素,提出了等离子体发射监控反应溅射镀膜的控制方案;进而,具体介绍了等离子体发射监控系统的传感器、执行器的结构与设计,并进行了PLC-PID控制软件的编程,实现了快速、稳定的控制功能,使反应溅射镀膜工作均匀;实际运行证明了本等离子发射监控设计合理性,可制备氮化钛、氧化钛化合物薄膜,具有良好的推广价值。
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| 关 键 词： | 等离子体发射监控 PLC PID |
Design of a Plasma Emission Monitoring System Used in a Reactive Sputtering Coating |
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| Xiao Jinyu,He Junping.Design of a Plasma Emission Monitoring System Used in a Reactive Sputtering Coating[J].Computer Measurement & Control,2011,19(7). |
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| Authors: | Xiao Jinyu He Junping |
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| Affiliation: | Xiao Jinyu1,He Junping2 (1.Maxford Technology LLC,Santa Clara,CA 95054,USA,2.Shenzhen Graduate School,Harbin Institute of Technology,ShenZhen 518055,China) |
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| Abstract: | A Plasma Emission Monitoring(PEM) control system based on Allen-Bradley PLC Controller is designed by means of PID algorithm in this paper.Sputter coating principle is introduced firstly and its disanvantage is analyzed too.Then a PEM control technology is proposed to improve sputter coating performance.Besides discussing the sensor,actuator and controller,PID control program in PLC is introduced.A prototype is built up and it works normally.In the end,several process related elements that affect the accura... |
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| Keywords: | plasma emission monitoring system PLC PID |
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