| 含钪钡钨阴极龟裂原因分析 |
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| 引用本文： | 杜支波,包生祥,张德政.含钪钡钨阴极龟裂原因分析[J].真空电子技术,2009(3):56-59. |
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| 作者姓名： | 杜支波 包生祥 张德政 |
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| 作者单位： | 电子科技大学,电子薄膜与集成器件国家重点实验室,四川,成都,610054 |
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| 摘 要： | 针对钪酸盐阴极在装管测试过程中发生发射电流下降，阴极表面出现龟裂等问题，利用扫描电镜和能谱作为研究手段，分析对比了失效阴极与正常阴极的微观结构差异，结果表明，阴极表面龟裂的原因是阴极发射物质成分和工作温度共同作用的结果。根据分析结果，调整工艺参数，解决了龟裂失效问题。
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| 关 键 词： | 钡钨阴极 微观结构 失效分析 龟裂 |
The Crazing Analysis in Sc2O3 Dispersed Barium Tungsten Cathode |
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| DU Zhi-bo,BAO Sheng-xiang,ZHANG De-zheng.The Crazing Analysis in Sc2O3 Dispersed Barium Tungsten Cathode[J].Vacuum Electronics,2009(3):56-59. |
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| Authors: | DU Zhi-bo BAO Sheng-xiang ZHANG De-zheng |
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| Affiliation: | (State Key Laboratory of Electronic Thin Films and Integrated Devices, University of Electronic Science and Technology of China, Chengdu 610054,China) |
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| Abstract: | To elucidate the cathode surface crazing phenomena when the launch electricity descended, the difference of the microstructures between invalid cathode and normal cathode with SEM and EDS is analyzed. Experimental results revealed that the crazing is due to the process of cathode substance and working temperature. According to the analysis we suggest that it would be better to adjust technologic parameter, the crazing phenomena is settled. |
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| Keywords: | Barium tungsten cathode Microstructure Failure analysis Crazing |
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