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Role of Oxygen Potential and Oxygen Ions on Phosphorus Removal from Silicon via Addition of FeO into Slag
Authors:Zhang  Nan  Qian  Guoyu  Wang  Zhi  Wei  Kuixian  Ma  Wenhui  Gong  Wei
Affiliation:1.Key Laboratory of Green Process and Engineering, National Engineering Laboratory for Hydrometallurgical Cleaner Production Technology, Institute of Process Engineering, Chinese Academy of Sciences, Beijing, 100190, People’s Republic of China
;2.Ferrous Metallurgy Department in School of Metallurgy, Northeastern University, Shenyang, Liaoning province, 110819, People’s Republic of China
;3.Faculty of Metallurgical and Energy Engineering, Kunming University of Science and Technology, Kunming, Yunnan province, 650093, People’s Republic of China
;
Abstract:

In present work, the role of the oxygen potential (PO2) and oxygen ion (O2−) concentration for removing phosphorus (P) during CaO–SiO2–Al2O3–FexO slag refining was studied by on-line measurement of oxygen activity in molten silicon (Si), FactSage calculation, Raman spectroscopy and nuclear magnetic resonance (NMR) spectroscopy. The results show that the addition of FeO from 0 to 9.25 wt% in slag can increase the activity of dissolved oxygen (aO]) in Si and the mole fraction of O2− in slag. Moreover, the increase of O2− concentration leads to the increase of non-bridge oxygen (NBO). The value of LP (the partition ratio of phosphorous between slag and Si shows a first increase and then decrease trend and reaches a maximum value of 1.95 at 5 ± 0.1 wt% FeO. It is believed that the increase of aO] and NBO can promote the removal of P as FeO content is less than 5 ± 0.1 wt%. the chain structure unit (Q2) of silicate network as the main intermediate structure to capture PO43− from the charge compensation of P2O5 by O2− to form the sheet structure unit Q3(Si and P). When FeO content is increased to more than 5 ± 0.1 wt%, LP value gradually decreases although the values of NBO and aO] are increasing. NBO plays a leading role in this process, it can be speculated that more NBO can depolymerize the Q3 (Si and P) to destroy the stability of P in silicate network. As a result, a mount of PO43− is present at the interface to prevent the oxidation of phosphorous, which leads to the decrease of LP value.

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