| 化学镀法制备钴包覆碳化硅复合粉末的研究 |
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| 引用本文： | 周超兰,张高科,甘慧慧.化学镀法制备钴包覆碳化硅复合粉末的研究[J].武汉理工大学学报,2011(7):5-9. |
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| 作者姓名： | 周超兰 张高科 甘慧慧 |
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| 作者单位： | 武汉理工大学材料科学与工程学院;武汉理工大学资源与环境工程学院; |
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| 基金项目： | 国家“973”资助项目(2007CB613302) |
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| 摘 要： | 采用化学镀法制备钴包覆碳化硅复合粉末,通过研究化学镀过程中钴盐浓度、还原剂浓度、络合剂浓度、缓冲剂浓度、温度以及pH值等因素对沉积速率的影响规律,得到化学镀钴的优化条件。利用XRD、SEM和EDAX等测试手段对该复合粉末的组分及形貌进行了表征。实验和表征结果表明,当硫酸钴浓度为30～50g/L,次磷酸钠浓度为40g/L,柠檬酸钠浓度为60～70g/L,控制温度为50～70℃以及调节pH值等于8时,镀层沉积速度较快,所得粉体表面被钴均匀包覆。
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| 关 键 词： | 化学镀法 碳化硅 钴 沉积速率 |
Preparation of Co/SiC Composite Particles Using Electroless Plating Method |
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| ZHOU Chao-lan,ZHANG Gao-ke,GAN Hui-hui.Preparation of Co/SiC Composite Particles Using Electroless Plating Method[J].Journal of Wuhan University of Technology,2011(7):5-9. |
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| Authors: | ZHOU Chao-lan ZHANG Gao-ke GAN Hui-hui |
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| Affiliation: | ZHOU Chao-lan1,ZHANG Gao-ke1,2,GAN Hui-hui2(1.School of Materials Science and Engineering,Wuhan University of Technology,Wuhan 430070,China,2.School of Resources and Environmental Engineering,China) |
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| Abstract: | Electroless plating method was employed to prepare Co/SiC composite particles.In the process of electroless deposition,the optimal conditions of electroless cobalt can be obtained through studying on the influence factors of the deposition rate,such as cobaltic salt concentration,deoxidizer concentration,complexing agent concentration,buffering agent concentration,temperature and pH value,etc.The composite particles were characterized by X-ray diffraction(XRD),Scanning electron microscope(SEM) and Energy di... |
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| Keywords: | electroless plating silicon carbide particles cobalt deposition rate |
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