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基于第四主族的类石墨烯二维材料最新进展:制备,性能和相关应用
引用本文:陈瑶瑶,武松浩,杨惠霞,黄泽平,张腾,孙家涛,刘立巍,王业亮. 基于第四主族的类石墨烯二维材料最新进展:制备,性能和相关应用[J]. 真空科学与技术学报, 2021, 0(2): 107-125
作者姓名:陈瑶瑶  武松浩  杨惠霞  黄泽平  张腾  孙家涛  刘立巍  王业亮
作者单位:北京理工大学低维量子结构与器件工业和信息化部重点实验室
基金项目:国家自然科学基金项目(61971035,61901038,61725107);中国科学院战略性先导科技专项(XDB30000000);北京市自然科学基金(Z190006,4192054);北京理工大学青年教师学术启动计划(3050011181814)。
摘    要:在类石墨烯时代,蜂窝状晶格排列的第四主族单层原子晶体(包括硅烯,锗烯,锡烯和铅烯)引起了广泛的关注.它们具有各种优异的特性,包括高载流子迁移率,线性色散能带和量子自旋霍尔效应,从而使其易于实现在许多前沿领域的应用.在本文中,作者回顾了基于第四主族二维材料的最新进展,重点研究了在不同基底上的制备,几何和电子特性及其在晶体...

关 键 词:硅烯  锗烯  锡烯  铅烯  分子束外延生长

Recent Progress of Group-IVA-Based 2D Materials Beyond Graphene: Fabrication,Properties and Related Applications
CHEN Yaoyao,WU Songhao,YANG Huixia,HUANG Zeping,ZHANG Teng,SUN Jiatao,LIU Liwei,WANG Yeliang. Recent Progress of Group-IVA-Based 2D Materials Beyond Graphene: Fabrication,Properties and Related Applications[J]. JOurnal of Vacuum Science and Technology, 2021, 0(2): 107-125
Authors:CHEN Yaoyao  WU Songhao  YANG Huixia  HUANG Zeping  ZHANG Teng  SUN Jiatao  LIU Liwei  WANG Yeliang
Affiliation:(MIIT Key Laboratory for Low-Dimensional Quantum Structure and Devices,Beijing Institute of Technology,Beijing 100081,China)
Abstract:In the post-graphene era,single layers of group-IVA atoms arranged in a honeycomb lattice(including silicene,germanene,stanene,and plumbene) have attracted extensive attention.They possess various remarkable properties,including high carrier mobility,linear dispersing energy bands,and quantum spin Hall effects(QSH),facilitating their versatile applications in many frontier fields.In this paper,we review the recent progress of group-IVA-based 2D materials(G42DM),focusing on the fabrication of G42DM on different substrates,the geometrical and electronic properties as well as their potential applications in transistors,batteries,gas sensors and so on.Finally,we also discuss the current challenges and opportunities in the G42DM area,which should inspire more research into this edge-cutting area of 2D materials.
Keywords:Silicene  Germanene  Stanene  Plumbene  MBE growth
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