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SiGe/Si HBT低频噪声特性研究
引用本文:张万荣,高攀,金冬月,张静,张正元,刘道广,王健安,徐学良,陈光炳.SiGe/Si HBT低频噪声特性研究[J].微电子学,2006,36(1):23-26.
作者姓名:张万荣  高攀  金冬月  张静  张正元  刘道广  王健安  徐学良  陈光炳
作者单位:1. 北京工业大学,电子信息与控制工程学院,北京,100022
2. 模拟集成电路国家重点实验室,重庆,400060
基金项目:国家重点实验室基金;中国科学院资助项目;北京市优秀人才培养基金
摘    要:对Si/Si1-xGexHBT的低频噪声进行了模拟。频率、基极电流、集电极电流、发射极几何尺寸(面积、条长)、Ge组份x、温度等诸多因素都对低频噪声有影响。模拟结果表明,Si/SiGeHBT具有优异的低频噪声特性。

关 键 词:SiGe/Si  异质结晶体管  低频噪声
文章编号:1004-3365(2006)01-0023-04
收稿时间:2005-04-26
修稿时间:2005-04-262005-06-30

Low-Frequency Noise Characteristics of Si/SiGe HBT's
ZHANG Wan-rong,GAO Pan,JIN Dong-yue,ZHANG Jing,ZHANG Zheng-yuan,LIU Dao-guang,WANG Jian-an,XU Xue-liang,CHEN Guang-bing.Low-Frequency Noise Characteristics of Si/SiGe HBT''''s[J].Microelectronics,2006,36(1):23-26.
Authors:ZHANG Wan-rong  GAO Pan  JIN Dong-yue  ZHANG Jing  ZHANG Zheng-yuan  LIU Dao-guang  WANG Jian-an  XU Xue-liang  CHEN Guang-bing
Affiliation:1. School of Electronic Information and Control Engineering, Beijing University of Technology, Beijing, 100022, P. R. China; 2. National Laboratory of Analog Integrated Circuits o Chongqing, 400060. P. R China
Abstract:Low-frequency noise characteristics of Si/Si_(1-x)Ge_x HBT's are simulated.Many factors,such as frequency,base current,collector current,geometry size(emitter area and length),Ge fraction and temperature,will have influence on low-frequency noise characteristics.Results from simulation show that Si/Si_(1-x)Ge_x HBT's have excellent low-frequency noise characteristics.
Keywords:Si/SiGe  Heterojunction transistor  Low frequency noise  
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