Magnetization reversal in nanotriangles fabricated by nanosphere lithography |
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Authors: | X.H. WangM. Chandra Sekhar I. PurnamaW.S. Lew S. GoolaupC.X. Cong |
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Affiliation: | School of Physical and Mathematical Sciences, Nanyang Technological University, 21 Nanyang Link 637371, Singapore |
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Abstract: | We report on the magnetization reversal behavior of sub 100-nm triangular shaped Ni80Fe20 dot array fabricated by nanosphere lithography. Hysteresis loops measured by magneto-optical Kerr effect magnetometry are classified into single and double-switched loops in 45 nm, 80 nm and 100 nm triangular nanomagnets. Micromagnetic simulations show that a plateau observed in the double-switched loop in the 100-nm triangular nanomagnet is due to the formation of a metastable mediating V state. |
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Keywords: | Nanosphere lithography Magnetic nanostructures Magnetization reversal Magnetic property simulation |
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