Carbide formation in tungsten-containing amorphous carbon films by annealing |
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Authors: | M BaldenPA Sauter S JongC Adelhelm S LindigM Rasinski T Plocinski |
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Affiliation: | a Max-Planck-Institut für Plasmaphysik, EURATOM Association, Boltzmannstrasse 2, 85748 Garching, Germanyb Warsaw University of Technology, Faculty of Material Science and Engineering, Woloska 141, 02-507, Poland |
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Abstract: | Tungsten-containing amorphous carbon films were produced by dual magnetron sputter deposition. The formation of carbide phases after heat treatment in inert gas at temperatures up to 2800 K was investigated by X-ray diffraction for tungsten concentrations below 25 at.%. After deposition, each film consists of an amorphous carbon matrix with atomically dispersed W inclusions. Annealing up to 2800 K leads to a formation of carbide phases and to nano clustering. Three tungsten carbide phases were observed (WC, W2C, and WC1 − x), mostly as mixtures of two phases. The phase combination depends on annealing temperature and W concentration. Additionally, nano diffraction was performed in a scanning transmission electron microscope, to determine the phase of single crystallites at scales, where X-ray diffraction fails. |
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Keywords: | Plasma-materials interaction Carbon-based amorphous films Chemical reactions |
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