Reliability assessment of indium tin oxide thin films by accelerated degradation test

The thermal degradation behavior and reliability of indium tin oxide (ITO) thin films deposited on glass substrates using radio frequency (rf) magnetron sputtering were investigated over the temperature range of 200–250^∘C in air. Accelerated degradation test (ADT) was performed to assess the reliability of ITO films. The lifetime of ITO films under normal operating condition (150^∘C) can be predicted to be 1.148 × 10⁵ h via statistical analysis and modeling of data acquired from ADT. The lifetime of ITO films was also evaluated using finite element analysis (FEA) based on the assumption of oxygen diffusion mechanism.