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高分子自组装掩膜的制备
引用本文:邓琛,徐晨,徐丽华,邹德恕,蒋文静,戴天明,李晓波,沈光地.高分子自组装掩膜的制备[J].高分子材料科学与工程,2010(1):151-154.
作者姓名:邓琛  徐晨  徐丽华  邹德恕  蒋文静  戴天明  李晓波  沈光地
作者单位:北京工业大学北京市光电子技术实验室;
基金项目:国家863计划项目资助(SQ007AA03Z431230);;北京市人才强教计划项目资助(05002015200504)
摘    要:利用高分子共混物的微相分离和自组装原理,采用溶液共混和旋转涂膜的方法制得聚苯乙烯/聚甲基丙烯酸甲酯(PS/PMMA)高分子共混物薄膜,对薄膜经过再加工得到具有纳米微孔的PMMA薄膜,研究了对溶液进行超声处理的时间、PS/PMMA共混物溶液浓度、旋涂转速和试片表面对掩膜形貌的影响。以此PMMA薄膜为掩膜对GaP表面进行湿法腐蚀,得到一种蜂窝状的表面微结构,它能使发光二极管(LED)的光功率平均提高18%。

关 键 词:高分子  自组装  微结构  发光二极管

Fabrication of Self-Assembled Polymer Mask
DENG Chen,XU Chen,XU Li-hua,ZOU De-shu,JIANG Wen-jing DAI Tian-ming,LI Xiao-bo,SHEN Guang-di.Fabrication of Self-Assembled Polymer Mask[J].Polymer Materials Science & Engineering,2010(1):151-154.
Authors:DENG Chen  XU Chen  XU Li-hua  ZOU De-shu  JIANG Wen-jing DAI Tian-ming  LI Xiao-bo  SHEN Guang-di
Affiliation:Beijing University of Technology;Beijing Optoelectronic Technology Laboratory;Beijing 100124;China
Abstract:Planar process is the foremost technology in fabrication of surface microstructure which is common in semiconductor devices.In microstructure fabrication,self-assembly is a technology which attracts much attention recently.In this article,based on the micro-phase separation and self-assembly of polymer blends,a polystyrene/poly methyl methacrylate(PS/PMMA) blend film was formed by solution co-blending and spin coating.A mask in which many nano-holes distribute regularly was developed from this film.The fact...
Keywords:polymer  self-assembly  microstructure  LED  
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