Hochrateabscheidung mit einem Mikrowellenplasma |
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Authors: | Stefan Merli Dr Andreas Schulz Dr Matthias Walker Prof Dr Ulrich Stroth Prof Dr Thomas Hirth |
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Affiliation: | 1. Institut für Plasmaforschung der Universit?t Stuttgart, Pfaffenwaldring 31, 70569 Stuttgart;2. Max‐Planck‐Institut, Plasmaphysik (IPP) Garching |
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Abstract: | High rate deposition with a microwave plasma The development of a plasma technological process of a scratch protection coating on plastics, for example on polycarbonate (PC), has to meet the conditions of a large area and a high rate deposition. The article presents a plasma technological concept, based on the scalable microwave plasma principle of the Duo‐Plasmaline, which provides due to the high plasma density a very high stationary coating rate of at least 20 μm/min with a high coating quality. The deposited protection coatings achieve the scratch resistance of window glass. |
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