NiMn薄膜的无序有序转变

研究了Si/Ta/NiMn/Al和Si/NiFe/NiMn/Al多层膜中NiMn薄膜经300℃ 5 h不同次数循环退火后的有序化情况，X射线衍射定量计算结果表明，高温循环退火能极大地促进NiMn薄膜的有序化、NiMn薄膜中有序相的含量随退火循环数的增加而持续增加，但含NiFe层的膜有序化过程要比无NiFe层时级慢．显然，NiFe对NiMn的有序化有阻碍作用．

Disorder-Order Transformation of NiMn Thin Films

The atomic disorder-Order transformation of NiMn thin films in the multilayers Si/Ta/NiMn/Al and Si/Ta/NiFe/NiMn/Al undergoing different number of annealing cycles at 300C for 5 hours was studied. Quantitative calculations of X-ray diffraction patterns show that annealing at a high temperature for several cycles can greatly facilitate the atomic ordering process of NiMn thin films. The relative amount of the ordered fct phase in NiMn thin films increases continuously with the increased number of annealing cycles. But for the multilayers containing a NiFe layer, the atomic ordering process of NiMn thin films is much slower compared with those without a NiFe layer. It is then evident that NiFe impedes the atomic ordering process of NiMn thin films.