| 磁性多层膜Ta/NiO/NiFe/Ta角分辨XPS |
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| 引用本文： | 于广华, 朱逢吾, 马纪东, 王安荣. 磁性多层膜Ta/NiO/NiFe/Ta角分辨XPS[J]. 工程科学学报, 2002, 24(2): 191-193. DOI: 10.13374/j.issn1001-053x.2002.02.024 |
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| 作者姓名： | 于广华 朱逢吾 马纪东 王安荣 |
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| 摘 要： | 磁性多层膜Ta/NiO/NiFe/Ta由磁控溅射方法制备.采用角分辨X射线光电子能谱(XPS)研究了反铁磁(Nio)/铁磁(NiFe)界面.结果表明,在NiO/NiFe界面发生了化学反应:NiO+Fe=Ni+ FeO和3NiO+2Fe-3Ni+Fe2O3,此反应深度约为1~1.5 nm.反应产物将影响NiO对NiFe的交换耦合.
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| 关 键 词： | 角分辨X射线光电子能谱 NiO/NiFe界面 交换耦合 界面反应 |
| 收稿时间： | 2001-12-31 |
Angle-resolved XPS Studies of Magnetic Multilayers Ta/NiO/NiFe/Ta |
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| YU Guanghua, ZHU Fengwu, MA Jidong, WANG Anrong. Angle-resolved XPS Studies of Magnetic Multilayers Ta/NiO/NiFe/Ta[J]. Chinese Journal of Engineering, 2002, 24(2): 191-193. DOI: 10.13374/j.issn1001-053x.2002.02.024 |
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| Authors: | YU Guanghua ZHU Fengwu MA Jidong WANG Anrong |
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| Abstract: | Ta/NiO/NiFe/Ta multilayers were prepared by magnetron sputtering. The composition and chemical states at the interface region of NiO/NiFe were studied using the angle-resolved X-ray photoelectron spectroscopy (XPS). The results show that there are two thermodynamically favorable reactions at NiO/NiFe interface: NiO+Fe = Ni+FeO and 3NiO+2Fe =3 Ni+Fe2O3 The thickness of the chemical reaction as estimated by angle-resolved XPS was about 1-1.5 nm. These interface reaction products are magnetic defects, and- the exchange coupling field Hex and the coercivity Hc of NiO/NiFe are affected by these defects. |
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| Keywords: | angle-resolved XPS NiO/NiFe exchange coupling interface reaction |
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