Effects of alloying elements on cobalt silicide formation |
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Authors: | C Lavoie C Cabral Jr F M d’Heurle J L Jordan-Sweet J M E Harper |
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Affiliation: | (1) IBM T.J. Watson Research Center, 10598 Yorktown Heights, NY |
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Abstract: | Alloying elements can substantially affect the formation of cobalt silicide. A comprehensive study of phase formation was
performed on 23 Co alloys with alloying element concentrations ranging from 1 at.% up to 20 at.%. Using in-situ characterization
techniques in which x-ray diffraction (XRD) and elastic-light scattering are monitored simultaneously, we follow the formation
of the silicide phases and the associated variation in surface roughness in real time during rapid thermal annealing. For
pure Co silicide, we detect the formation of all stable silicide phases (Co2Si, CoSi, and CoSi2) as well as abnormal grain growth in the Co film and thermal degradation of the silicide layer at high temperatures. The
effect of the various additives on phase formation was determined. The roughness of the interface was also measured using
grazing incidence x-ray reflectivity (GIXR). We show that by selecting an alloy with a specific composition, we can change
the phase-formation temperatures and modify the final CoSi2 film texture and roughness. |
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Keywords: | Co silicide Co alloys XRD elastic-light scattering |
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