| 薄膜厚度测量技术 |
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| 引用本文： | 王浩,邹积岩.薄膜厚度测量技术[J].微细加工技术,1993(1):55-60. |
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| 作者姓名： | 王浩 邹积岩 |
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| 作者单位： | 华中理工大学电力系，华中理工大学电力系 武汉 430074，武汉 430074 |
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| 摘 要： | 随着各种表面沉积技术(PVD、CVD)日益广泛地应用于微电子、光学及超导薄膜沉积等微细加工领域,膜厚在10—10~2nm范围内的薄膜厚度测量技术也不断得到发展。本文系统地描述了各种测量技术的原理、属性及测量方法,并对其测量精度及适用范围进行了比较。
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| 关 键 词： | 薄膜 厚度 测量 表面沉积 |
THIN FILM THICKNESS MEASUREMENT TECHNIQUES |
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| Wang Hao Zou jiyan.THIN FILM THICKNESS MEASUREMENT TECHNIQUES[J].Microfabrication Technology,1993(1):55-60. |
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| Authors: | Wang Hao Zou jiyan |
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| Abstract: | While a variety of film deposion techniques (PVD,CVD) gained a wide use in the field of microprocess such as eletronic, optical and super-conductor film deposition, measurement techniques of film thickness which is in the range of 10~104nm are being developed. The principles and measurement methods of these techniques are presented in this paper. Their accuracies and application fields are compared as |
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| Keywords: | film thickness measurement techniques |
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