磁控溅射氧化钒薄膜的研究进展

氧化钒因其优秀的相变特性和电阻开关特性而广受关注,在氧化钒薄膜多种制备工艺中,磁控溅射法优势明显。本文总结了近年来国内外研究者对磁控溅射法制备氧化钒薄膜的基础工艺研究成果,概述了不同溅射工艺对二氧化钒薄膜结晶特性及光学、电学性能的影响,并对相关机理进行了简要分析。相关结论对氧化钒薄膜的性能提高和应用扩展有一定的指导意义。

RESEARCH PROGRESS OF VANADIUM OXIDE THIN FILM BY MAGNETRON SPUTTERING

Vanadium oxide received extensive attention because of its excellent phase transition characteristics and resistance switching characteristics.In a variety of preparation process of vanadium oxide thin films,magnetron sputtering method has obvious advantages.This paper summarizes the research on basis progress of vanadium oxide thin films prepared by magnetron sputtering process in recent years,and reviews the effects of different sputtering process on the crystalline characteristics and optical,electrical properties of vanadium dioxide thin-film,and provides a brief analysis of the relative mechanism.The relevant conclusions has a good guide on improving the performance and application expansion of vanadium oxide thin films.