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Application of the Island Blister Test for Thin Film Adhesion Measurement
Authors:Mark G Allen  Stephen D Senturia
Affiliation:Microsystems Technology Laboratories , Massachusetts Institute of Technology , Cambridge, MA, 02139, U.S.A.
Abstract:The island blister test has recently been proposed as an adhesion test which allows the peel of thin, well-adhered films without exceeding the tensile strength of the film. The island blister test site is a modification of the standard blister test site, consisting of a suspended membrane of film with an “island” of substrate at the film center. The membrane support and island are secured to a rigid plate and the film is pressurized, peeling the film inward off the island. A model for this inward or “annular” peel indicates that even for systems of good adhesion, peel can be initiated at low enough pressures to prevent film failure by making the center island sufficiently small relative to the size of the film.

We have fabricated island blister test sites using micromachining techniques and have used them to measure the debond energy of polymer films on various substrates. The peel data obtained from these island sites match well to the behavior predicted by a simple fracture mechanics analysis. This paper reports the fabrication of the island test sites, the experimental verification of the test, and the results of application of the test to polyimide films on metallic and polymeric substrates.
Keywords:adhesion  island blister geometry  peeling of thin films  polyimide/metal adhesion  polyimide/polyimide adhesion  debond energy
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