Effect of process parameters and optimization for photochemical machining of brass and german silver |
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Authors: | Sandeep Sitaram Wangikar Promod Kumar Patowari Rahul Dev Misra |
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Affiliation: | 1. Department of Mechanical Engineering, National Institute of Technology Silchar, Silchar, Assam, India;2. Department of Mechanical Engineering, SVERI’s College of Engineering, Pandharpur, Maharashtra, India |
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Abstract: | This article focuses on parametric optimization for photochemical machining (PCM) of brass and german silver. The aim of the study is to analyze the effect of control parameters on response measures, that is, surface roughness, material removal rate, and edge deviation and optimization of parameters considering different weight percentage for each performance measure. The control parameters have been selected as etchant concentration, etching temperature, and etching time. Using full factorial method of design of experiments, PCM has been carried out using ferric chloride as etchant. Surface roughness and edge deviation should be less, while material removal rate is desired high. For satisfying this multi-objective condition, overall evaluation criteria (OEC) have been formulated by assigning different and equal weight percentage to response measures. The optimized condition for particular OEC is obtained, and analysis of variance (ANOVA) has been performed for observing effect of control parameters on response measures. Surface topography study has been performed using scanning electron microscopy, and material composition analysis has been carried out using energy dispersive spectroscopy. The surface roughness is observed lower for brass, while the edge deviation is found lesser for german silver. The material removal rate is observed higher for brass compared to german silver. |
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Keywords: | Brass german silver photochemical machining MRR surface roughness edge deviation OEC |
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