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Toward High‐Performance Top‐Gate Ultrathin HfS2 Field‐Effect Transistors by Interface Engineering |
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| Authors: | Kai Xu Yun Huang Bo Chen Yang Xia Wen Lei Zhenxing Wang Qisheng Wang Feng Wang Lei Yin Jun He |
| Affiliation: | 1. CAS Key Laboratory of Nanosystem and Hierarchical Fabrication, National Center for Nanoscience and Technology, Beijing, P. R. China;2. Institute of Microelectronics of Chinese Academy of Sciences, Beijing, P. R. China;3. School of Electrical, Electronic and Computer EngineeringThe University of Western Australia, Crawley, WA, Australia |
| Abstract: | |
| Keywords: | field‐effect transistors HfO2 HfS2 interface engineering |