Pareparation of photosensitive polymers containing pendant cinnamic acid,ethyl cinnamate or cinnamaldehyde groups by chemical modification of polystyrene |
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| Authors: | M. Jean Farrall |
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| Affiliation: | (1) Ottawa-Carleton Institute for Research and Graduate Studies in Chemistry, University of Ottawa Campus, KIN 9B4 Ottawa, Ontario, Canada |
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| Abstract: | Summary Soluble polystyrene was chemically modified to introduce pendant cinnamic acid, cinnamate ester, or cinnamaldehyde groups. The sensitivity of these polymers to crosslinking by ultraviolet light was studied by the adhesion method. Both the cinnamic acid and the cinnamaldehyde groups were found to crosslink more effectively than the cinnamate ester, the group which is commonly used in photoresists. |
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