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Equilibrium formation and thermodynamic properties of gaseous silicon monosulfide
Authors:J J Byerley  W K Teo
Affiliation:(1) Metallurgical Chemistry Research Laboratory, Department of Chemical Engineering, University of Waterloo, Waterloo, Ontario, Canada
Abstract:The formation of gaseous silicon monosulfide according to the reaction 1/2 SiS2(s + 1/2 Si(s) = SiS(g) has been studied by the Knudsen effusion-gravimetric technique over the temperature range 863 to 1161 K. The equilibrium SiS pressure may be expressed by the equation logP SiS(atm) = 7.205 -12,600T −1+ 0.4677 logT -4.508 × 10−4 T + 29.88T −1/2 The experimental free energy of the reaction may be represented by the two-term expression ΔF 863-1161 K 0 = 54,270 -38.34T Combination of these results and recent experimental data provide the standard free energy of formation of gaseous silicon monosulfide as expressed by ΔF 863-1686 K 0 = 12,740 -19.18T Si(s ) + 1/2 S2(g) = SiS(g) ΔF 1686-2953 K 0 = 640 -12.02T Si(l) + 1/2 S2(g) = SiS(g)
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