Equilibrium formation and thermodynamic properties of gaseous silicon monosulfide |
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Authors: | J J Byerley W K Teo |
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Affiliation: | (1) Metallurgical Chemistry Research Laboratory, Department of Chemical Engineering, University of Waterloo, Waterloo, Ontario, Canada |
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Abstract: | The formation of gaseous silicon monosulfide according to the reaction 1/2 SiS2(s
+ 1/2 Si(s)
= SiS(g) has been studied by the Knudsen effusion-gravimetric technique over the temperature range 863 to 1161 K. The equilibrium
SiS pressure may be expressed by the equation logP
SiS(atm) = 7.205 -12,600T
−1+ 0.4677 logT -4.508 × 10−4
T + 29.88T
−1/2 The experimental free energy of the reaction may be represented by the two-term expression ΔF
863-1161 K
0
= 54,270 -38.34T Combination of these results and recent experimental data provide the standard free energy of formation of gaseous silicon
monosulfide as expressed by ΔF
863-1686 K
0
= 12,740 -19.18T Si(s ) + 1/2 S2(g) = SiS(g) ΔF
1686-2953 K
0
= 640 -12.02T Si(l) + 1/2 S2(g) = SiS(g) |
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Keywords: | |
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