| 常压化学气相沉积方法制备非晶硅薄膜及其光致发光性能研究 |
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| 引用本文： | 刘涌,肖瑛,沃银花,宋晨路,韩高荣.常压化学气相沉积方法制备非晶硅薄膜及其光致发光性能研究[J].真空科学与技术学报,2004,24(6):469-471. |
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| 作者姓名： | 刘涌 肖瑛 沃银花 宋晨路 韩高荣 |
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| 作者单位： | 浙江大学材料系硅材料国家重点实验室,杭洲,310027 |
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| 基金项目： | 国家高技术研究发展计划(863计划) |
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| 摘 要： | 使用改进的常压化学气相沉积(APCVD)系统制备了非晶硅薄膜,测量了样品的光致发光特性,使用Raman光谱和X射线光电子能谱(XPS)谱测量了薄膜的微结构特征.样品在523 nm出现发光峰,Raman光谱和XPS谱表明制备的薄膜结构中存在富氧相和富硅相的分相现象,分析认为相界面的存在是产生发光的原因.Raman光谱分峰结果表明薄膜中存在纳米晶粒.
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| 关 键 词： | 光致发光 非晶硅 Raman XPS |
| 文章编号： | 1672-7126(2004)06-0469-03 |
| 修稿时间： | 2004年1月13日 |
Photoluminescence of Amorphous Si Films Prepared by AtmosphericPressure Chemical Vapor Deposition |
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| Liu Yong,Xiao Ying,Wo Yinhua,Song Chenlu and Han Gaorong.Photoluminescence of Amorphous Si Films Prepared by AtmosphericPressure Chemical Vapor Deposition[J].JOurnal of Vacuum Science and Technology,2004,24(6):469-471. |
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| Authors: | Liu Yong Xiao Ying Wo Yinhua Song Chenlu and Han Gaorong |
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| Affiliation: | Liu Yong*,Xiao Ying,Wo Yinhua,Song Chenlu and Han Gaorong |
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| Abstract: | Amorphous Si films were grown by atmospheric pressure chemical vapor deposition (APCVD).Its microstructures and optical properties were characterized with p hoto-luminescence (PL) spectroscopy.Raman and X-ray photoelectron spectroscopy (XPS).A green luminescence peak at 523 nm was observed.Raman and XPS spectra sh ow that the films display Si-rich and O-rich phases.We suggest that the phase interfaces result in the luminescence.Data fitting of Raman spectra indicates th at Si nano-crystalline grains are embedded in the films. |
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| Keywords: | Photoluminescence Amorphous Si Raman XPS |
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