Synthesis and photoinduced surface relief grating formation of novel photo-responsive amorphous molecular materials, 4-[bis(9,9-dimethylfluoren-2-yl)amino]-4′-cyanoazobenzene and 4-[bis(9,9-dimethylfluoren-2-yl)-amino]-4′-nitroazobenzene |
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Authors: | Hideyuki Nakano Toru Takahashi Takahiro Tanino Yasuhiko Shirota |
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Affiliation: | aDepartment of Applied Chemistry, Faculty of Engineering, Osaka University, Yamadaoka, Suita, Osaka 565-0871, Japan;bDepartment of Environmental and Biotechnological Frontier Engineering, Fukui University of Technology, 3-6-1, Gakuen, Fukui City, Fukui 910-8505, Japan |
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Abstract: | Novel azobenzene-based photo-responsive amorphous molecular materials, 4-[bis(9,9-dimethylfluoren-2-yl)amino]-4′-cyanoazobenzene and 4-[bis(9,9-dimethylfluoren-2-yl)amino]-4′-nitroazobenzene, have been synthesized and the formation of surface relief grating on their amorphous films has been investigated. It was found that a relatively large surface relief grating could be inscribed on both amorphous films upon interference exposure to the writing laser beams. The modulation depth of the surface relief grating inscribed on the amorphous film of the cyano-substituted material was found to be larger than that inscribed on the film of the nitro-substituted one and seemed to be comparable to that inscribed on the amorphous film of the parent material, 4-[bis(9,9-dimethylfluoren-2-yl)amino]azobenzene. These results were discussed from the viewpoint of their trans–cis photoisomerizations as amorphous films and glass-transition temperatures. |
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Keywords: | Photo-responsive amorphous molecular material Photoinduced surface relief grating formation Azobenzene trans– cis Photoisomerization Glass-transition temperature |
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