| 磁控溅射AuNi5的热处理 |
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| 引用本文： | 余前春,张晓辉,范金铎,何毅,刘凤龙,江轩. 磁控溅射AuNi5的热处理[J]. 稀有金属, 2003, 27(1): 135-138 |
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| 作者姓名： | 余前春 张晓辉 范金铎 何毅 刘凤龙 江轩 |
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| 作者单位： | 有研亿金新材料股份有限公司,北京,100088 |
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| 基金项目： | 科研院所技术开发研究专项基金项目 (NCSTE 2 0 0 1 JKZX 0 47) |
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| 摘 要： | 采用磁控溅射方法制备了AuNi5/Ni两层复合材料中的AuNi5膜层，并对样品进行退火处理。应用金相显微分析，划痕法和SEM，研究了AuNi5膜层的结构及性能特点，经退火后，分析了AuNi5膜层与Ni基体层间的元素互扩散，结合强度及应力与热处理工艺的关系。Ni层的处理和表面状态对AuNi5膜层和Ni金属层间的结合强度有重要的影响。
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| 关 键 词： | 磁控溅射 热处理 结合强度 互扩散 |
| 文章编号： | 0258-7076(2003)01-0135-04 |
| 修稿时间： | 2002-09-10 |
Heat Treatment of AuNi5 Prepared by Magnetron Sputtering |
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| Abstract: | The AuNi 5 film structure AuNi 5/Ni was prepared by magnetron sputtering and then was treated by annealing. By metalloscopy, scale adhere test and scanning electron microscope,the structure and properties of the AuNi 5 layer were studied. The influence of annealing on the interdiffusion,joint strength between AuNi 5 film and Ni substrate were discussed. The treatment and state of substrate surface has an important effect on the joint strength between AuNi 5 film and Ni layer. |
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| Keywords: | magnetron sputtering heat treatment joint strength interdiffusion |
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